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Influence of oxygen on Er-related emission in GaN with a large yellow band

机译:氧对大黄带GaN中Er相关发射的影响

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In order to investigate the luminescence properties of Er~(3+) in GaN and the effect of oxygen (O) on Er~(3+) - related emission in GaN:Er, erbium (Er) ions were implanted into single-crystal h-GaN grown on a c-axis sapphire substrate at an energy of 2MeV. Oxygen ions were subsequently coimplanted into GaN with Er ions. The influence of oxygen on Er-related emission in GaN with a large yellow band was studied by comparing photoluminescence (PL) measurements of GaN:Er, O. It was found that the optimum annealing temperature to obtain maximum PL intensity was 1200 deg and that the Er~(3+)-related PL intensities from GaN:Er, O samples were negligibly enhanced in comparison with the GaN:Er samples. The temperature dependence of PL intensity in GaN:Er,O showed no appreciable difference from that of GaN:Er. But good correlation between Er-related and a large yellow band emission was observed in GaN. This indicates that codoped oxygen ions influence Er-related and yellow band emission in GaN.
机译:为了研究GaN中Er〜(3+)的发光特性以及氧(O)对GaN:Er中Er〜(3+)相关发射的影响,将((Er)离子注入单晶中h-GaN以2MeV的能量在c轴蓝宝石衬底上生长。随后将氧离子与Er离子共注入GaN中。通过比较GaN:Er,O的光致发光(PL)测量,研究了氧对具有较大黄带的GaN中Er相关发射的影响。发现获得最大PL强度的最佳退火温度为1200度,与GaN:Er样品相比,GaN:Er,O样品的Er〜(3+)相关PL强度可忽略不计。 GaN:Er,O中PL强度的温度依赖性与GaN:Er没有显着差异。但是,在GaN中观察到了Er相关和大的黄带发射之间的良好相关性。这表明共掺杂的氧离子会影响GaN中与Er有关的和黄带发射。

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