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Two yellow luminescence bands in undoped GaN

机译:未掺杂GaN中的两个黄色发光带

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摘要

Two yellow luminescence bands related to different defects have been revealed in undoped GaN grown by hydride vapor phase epitaxy (HVPE). One of them, labeled YL1, has the zero-phonon line (ZPL) at 2.57 eV and the band maximum at 2.20 eV at low temperature. This luminescence band is the ubiquitous yellow band observed in GaN grown by metalorganic chemical vapor deposition, either undoped (but containing carbon with high concentration) or doped with Si. Another yellow band, labeled YL3, has the ZPL at 2.36 eV and the band maximum at 2.09 eV. Previously, the ZPL and fine structure of this band were erroneously attributed to the red luminescence band. Both the YL1 and YL3 bands show phonon-related fine structure at the high-energy side, which is caused by strong electron-phonon coupling involving the LO and pseudo-local phonon modes. The shapes of the bands are described with a one-dimensional configuration coordinate model, and the Huang-Rhys factors are found. Possible origins of the defect-related luminescence bands are discussed.
机译:在氢化物气相外延(HVPE)生长的未掺杂GaN中,已经发现了与不同缺陷相关的两个黄色发光带。其中一个标为YL1的零声子线(ZPL)的温度为2.57VeV,在低温下的最大能带为2.20VeV。该发光带是在金属有机化学气相沉积法生长的GaN中观察到的普遍存在的黄带,未掺杂(但包含高浓度的碳)或掺杂有Si。另一个标记为YL3的黄色带的ZPL为2.36 eV,最大带为2.09 eV。以前,ZPL和该波段的精细结构被错误地归因于红色发光波段。 YL1和YL3波段在高能侧均显示了与声子相关的精细结构,这是由于涉及LO和伪局部声子模式的强电子-声子耦合引起的。用一维构型坐标模型描述带的形状,并找到黄-Rhys因子。讨论了与缺陷有关的发光带的可能起源。

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