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Yellow luminescence band in undoped GaN revealed by two-wavelength excited photoluminescence

机译:两波长激发光致发光显示未掺杂GaN中的黄色发光带

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摘要

The below-gap emission components including yellow luminescence (YL) band of an MOCVD grown undoped GaN have been studied by the two-wavelength-excited photoluminescence (TWEPL). The nature of each emission line has been investigated by using an intermittent below-gap excitation (BGE) light of 1.17 eV on an above-gap excitation (AGE) light of 3.49 eV. The intensity of DAP and the YL decreased while it increased for I-OX after irradiation of the BGE. The intensity change in PL after addition of the BGE implies the presence of defect levels in the energy position corresponding to the photon energy of the BGE. Possible recombination models are listed and examined. Only the recombination model in which the YL corresponds to the transition from a shallow donor to a deep state at about 1 eV above the valence band maximum satisfies our experimental result. The possible origin of this defect state is discussed. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过两波长激发光致发光(TWEPL)研究了MOCVD生长的未掺杂GaN的包括黄光(YL)带在内的带隙以下发射成分。通过使用1.17 eV的间歇式间隙以下激发(BGE)光和3.49 eV的间隙上方激发(AGE)光,研究了每个发射线的性质。 BGE照射后,I-OX的DAP和YL强度降低,而I-OX则升高。添加BGE后PL的强度变化暗示在对应于BGE的光子能量的能量位置中存在缺陷能级。列出并检查了可能的重组模型。只有其中YL对应于在价带最大值上方约1 eV处从浅供体到深态的跃迁的重组模型才能满足我们的实验结果。讨论了此缺陷状态的可能原因。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Optical Materials》 |2016年第10期|481-486|共6页
  • 作者单位

    Saitama Univ Dept Funct Mat Sci Sakura Ku 255 Shimo Okubo Saitama 3388570 Japan|Rajshahi Univ Dept Appl Phys & Elect Engn Rajshahi 6205 Bangladesh;

    Saitama Univ Dept Funct Mat Sci Sakura Ku 255 Shimo Okubo Saitama 3388570 Japan;

    Univ Tokyo Inst Ind Sci Meguro Ku 4-6-1 Komaba Tokyo 1538505 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN; Yellow luminescence; Photoluminescence; TWEPL; Below-gap excitation;

    机译:氮化镓;黄色发光;光致发光;TWEPL;间隙以下激发;

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