首页> 外文会议>Conference on VLSI Circuits and Systems May 19-21, 2003 Maspalomas, Gran Canaria, Spain >Laser-induced structure defects and their use for modification of properties of (Cd,Hg)Te epitaxial layers and CdTe crystals
【24h】

Laser-induced structure defects and their use for modification of properties of (Cd,Hg)Te epitaxial layers and CdTe crystals

机译:激光诱导的结构缺陷及其在改变(Cd,Hg)Te外延层和CdTe晶体性能中的用途

获取原文
获取原文并翻译 | 示例

摘要

This Paper examines the experimental researches of structural defect generation in (Cd,Hg)Te epitaxil layers on CdTe substrates and CdTe mono-crystals after pulse laser treatment and the influence of these defects on mechanical, optical and galvano-magnetic properties of the samples. In the experiments we used the ruby laser radiation with energy density changed in the range 1,5-15 J/cm~2. The duration of laser pulses (τ) was about 1,5 ms. Changes in the chemical composition of the irradiated surface have been analyzed by the Auger electron spectroscopy. The zones with increased defect concentration were determined by the method of the selective chemical etching. It has been determined that the pulse laser processing results in both the essential redistribution of the component concentration and generation of the point and extended defects in near-surface crystal layers excited by laser irradiation. After the laser irradiation of the samples the redistribution of the intensity of the luminescence bands and emergence of a new band were observed over the band 840 nm at the temperature of samples about 4,2 K. The essential growth of the spectral band intensity with a maximum within the band 875-885 nmat T= 77 K has been observed as well.
机译:本文研究了在脉冲激光处理后CdTe衬底和CdTe单晶上的(Cd,Hg)Te表紫杉醇层中产生结构缺陷的实验研究以及这些缺陷对样品的机械,光学和电磁性能的影响。在实验中,我们使用了能量密度在1,5-15 J / cm〜2范围内变化的红宝石激光辐射。激光脉冲的持续时间(τ)约为1.5毫秒。通过俄歇电子能谱分析了被照射表面的化学组成的变化。通过选择性化学蚀刻的方法确定缺陷浓度增加的区域。已经确定,脉冲激光加工导致组分浓度的基本重新分布以及点的产生和在通过激光照射激发的近表面晶体层中的缺陷的扩展。在样品进行激光照射后,在大约4.2 K的样品温度下,在840 nm波段观察到了发光带强度的重新分布和新谱带的出现。还观察到T = 77K时在875-885nm频带内的最大值。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号