首页> 外国专利> Method for growing an epitaxial layer of CdTe on an epitaxial layer of HgCdTe grown on a CdTe substrate

Method for growing an epitaxial layer of CdTe on an epitaxial layer of HgCdTe grown on a CdTe substrate

机译:在CdTe衬底上生长的HgCdTe外延层上生长CdTe外延层的方法

摘要

Disclosed is a method of growing a layer of CdTe on HgCdTe by liquid phase epitaxy. The solution for growth comprises Sn and Hg with a small amount of CdTe. A typical composition is Sn:Hg:CdTe=36:5:0.15 parts by weight. The growth temperature is a function of the amount of CdTe in solution. For the typical composition stated, the growth temperature is about 520 C. The layers were grown on (111)A oriented CdTe substrates. The HgCdTe epilayer with a desired Cd composition is first grown, and an epilayer of CdTe is subsequently grown on the HgCdTe epilayer. The cross-diffusion at the CdTe/Hg.sub.1-x Cd.sub.x Te interface has been as small as 0.3 m for the thin CdTe epilayer. The first CdTe/HgCdTe heterojunction sensitive to 2.8 m at 77K has been demonstrated.
机译:公开了一种通过液相外延在HgCdTe上生长CdTe层的方法。生长溶液包括锡和汞以及少量的碲化镉。典型的组成是Sn:Hg:CdTe = 36:5:0.15重量份。生长温度是溶液中CdTe量的函数。对于所述的典型组成,生长温度为约520℃。使层在(111)A取向的CdTe衬底上生长。首先生长具有所需Cd组成的HgCdTe外延层,然后在HgCdTe外延层上生长CdTe外延层。对于薄CdTe外延层,CdTe / Hg1-x Cdx Te界面处的交叉扩散小至0.3 m。已经证明了第一个对77k处2.8 m敏感的CdTe / HgCdTe异质结。

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