Southern Federal University, Institute of Nanotechnologies, Electronics, and Equipment Engineering, Department of Nanotechnologies and Microsystems, Shevchenko 2 st., Taganrog, Russia kliminv.s@mail.ru;
Southern Federal University, Institute of Nanotechnologies, Electronics, and Equipment Engineering, Department of Nanotechnologies and Microsystems, Shevchenko 2 st., Taganrog, Russia;
Southern Federal University, Institute of Nanotechnologies, Electronics, and Equipment Engineering, Department of Nanotechnologies and Microsystems, Shevchenko 2 st., Taganrog, Russia;
Southern Federal University, Institute of Nanotechnologies, Electronics, and Equipment Engineering, Department of Nanotechnologies and Microsystems, Shevchenko 2 st., Taganrog, Russia;
Southern Federal University, Research and Education Center "Nanotechnology", Shevchenko 2 st., Taganrog, Russia ageev@sfedu.ru;
机译:等离子体蚀刻通过Ga〜+离子聚焦束形成的掩模形成的硅基纳米结构
机译:GaAs / AlGaAs双异质结构激光通过聚焦离子束刻蚀与无源波导整体集成
机译:Cl_2 / Ar等离子体化学辅助离子束工艺中GaAs ECR蚀刻的优化
机译:通过Ga +的聚焦离子束对GaAs基板的掩模形成,用于等离子体化学蚀刻
机译:通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导:设计,制造和表征。
机译:单个GaAs纳米线在聚焦离子束定义的位置上的掠入射X射线衍射
机译:GaAs的氯化学辅助离子束刻蚀行为取决于表面温度
机译:用扫描聚焦激光微光电化学蚀刻n-Gaas