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AlGaN-based structures on sapphire for visible blind Schottky-barrier UVphotodetectors: toward high-performance device applications,

机译:蓝宝石上基于AlGaN的结构适用于可见的肖特基势垒紫外光电探测器:面向高性能器件应用,

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Abstract: Al$-x$/Ga$-1$MIN@x$/N material system, whose bandgap lies in the 3.42-6.2 eV range, is extremely interesting for visible and solar blind UV photodetector applications. This paper describes the device performances of Al$-x$/Ga$-1$MIN@x$/N UV Schottky barrier photodetectors for visible-blind applications grown on c-oriented sapphire, with a detailed balance with the basic materials properties. Conventional low temperature grown AlN or GaN were used in all applications. High quality Schottky barrier photodiodes made of Epitaxial Lateral Overgrown (ELOG) GaN are also presented. All Schottky barrier devices show a fast time response, a high UV-visible rejection factor, and high absolute values of above bandgap responsivities. A new application of AlGaN UV Schottky barrier photodetectors to monitor the biological action of the solar UV radiation, as well as the device performance of high quality GaN and AlGaN Metal Semiconductor Metal with cutoff wavelengths as short as 310 nm, are described in detail. !54
机译:摘要:Al $ -x $ / Ga $ -1 $ MIN @ x $ / N材料系统的带隙在3.42-6.2 eV范围内,对于可见光和日盲UV光电探测器应用极为感兴趣。本文介绍了Al $ -x $ / Ga $ -1 $ MIN @ x $ / N UV肖特基势垒光电探测器的器件性能,该探测器适用于在c取向蓝宝石上生长的可见盲应用,并在基本材料特性之间取得了详细的平衡。在所有应用中均使用常规的低温生长AlN或GaN。还介绍了由外延横向生长(ELOG)GaN制成的高质量肖特基势垒光电二极管。所有的肖特基势垒器件都显示出快速的时间响应,高的紫外线可见抑制因子以及上述带隙响应率的绝对值很高。详细介绍了AlGaN UV肖特基势垒光电探测器在监测太阳紫外线辐射的生物作用以及截止波长短至310 nm的高质量GaN和AlGaN金属半导体金属的器件性能方面的新应用。 !54

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