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AlGaN-based structures on sapphire for visible blind Schottky-barrier UV photodetectors: toward high-performance device applications

机译:蓝宝石上基于AlGaN的结构用于可见的肖特基势垒紫外可见光探测器:面向高性能器件应用

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Abstract: Al$-x$/Ga$-1$MIN@x$/N material system, whose bandgaplies in the 3.42-6.2 eV range, is extremely interestingfor visible and solar blind UV photodetectorapplications. This paper describes the deviceperformances of Al$-x$/Ga$-1$MIN@x$/N UV Schottkybarrier photodetectors for visible-blind applicationsgrown on c-oriented sapphire, with a detailed balancewith the basic materials properties. Conventional lowtemperature grown AlN or GaN were used in allapplications. High quality Schottky barrier photodiodesmade of Epitaxial Lateral Overgrown (ELOG) GaN are alsopresented. All Schottky barrier devices show a fasttime response, a high UV-visible rejection factor, andhigh absolute values of above bandgap responsivities. Anew application of AlGaN UV Schottky barrierphotodetectors to monitor the biological action of thesolar UV radiation, as well as the device performanceof high quality GaN and AlGaN Metal Semiconductor Metalwith cutoff wavelengths as short as 310 nm, aredescribed in detail. !54
机译:摘要:Al $ -x $ / Ga $ -1 $ MIN @ x $ / N材料系统的带隙在3.42-6.2 eV范围内,对于可见光和日盲UV光电探测器应用非常有趣。本文介绍了Al $ -x $ / Ga $ -1 $ MIN @ x $ / N UV肖特基势垒光电探测器在C取向蓝宝石上生长的可见盲应用的器件性能,并与基本材料特性进行了详细的权衡。在所有应用中均使用常规的低温生长AlN或GaN。还展示了由外延横向生长(ELOG)GaN制成的高质量肖特基势垒光电二极管。所有的肖特基势垒器件都显示出快速响应,高紫外可见抑制因子和上述带隙响应的绝对值高。详细介绍了AlGaN UV肖特基势垒光电探测器在监测太阳紫外线辐射的生物学作用以及截止波长短至310 nm的高质量GaN和AlGaN金属半导体金属的器件性能方面的新应用。 !54

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