首页> 外文会议>Conference on Oxide-based Matericals and Devices >Persistent photocurrent and deep level traps in PLD-grown In-Ga-Zn-O thin films studied by thermally stimulated current spectroscopy
【24h】

Persistent photocurrent and deep level traps in PLD-grown In-Ga-Zn-O thin films studied by thermally stimulated current spectroscopy

机译:热激电流光谱研究PLD生长的In-Ga-Zn-O薄膜中的持久光电流和深能级陷阱

获取原文
获取原文并翻译 | 示例

摘要

InGaZnO (IGZO) is a promising semiconductor material for thin-film transistors (TFTs) used in DC and RF switching applications, especially since it can be grown at low temperatures on a wide variety of substrates. Enhancement-mode TFTs based on IGZO thin films grown by pulsed laser deposition (PLD) have been recently fabricated and these transistors show excellent performance; however, compositional variations and defects can adversely affect film quality, especially in regard to electrical properties. In this study, we use thermally stimulated current (TSC) spectroscopy to characterize the electrical properties and the deep traps in PLD-grown IGZO thin films. It was found that the as-grown sample has a DC activation energy of 0.62 eV, and two major traps with activation energies at ~ 0.16-0.26 eV and at ~ 0.90 eV. However, a strong persistent photocurrent (PPC) sometimes exists in the as-grown sample, so we carry out post-growth annealing in an attempt to mitigate the effect. It was found that annealing in argon increases the conduction, produces more PPC and also makes more traps observable. Annealing in air makes the film more resistive, and removes PPC and all traps but one. This work demonstrates that current-based trap emission, such as that associated with the TSC, can effectively reveal electronic defects in highly-resistive semiconductor materials, especially those are not amenable to capacitance-based techniques, such as deep-level transient spectroscopy (DLTS).
机译:InGaZnO(IGZO)是用于DC和RF开关应用中的薄膜晶体管(TFT)的有前途的半导体材料,特别是因为它可以在低温下在各种基板上生长。最近已经制造了基于通过脉冲激光沉积(PLD)生长的IGZO薄膜的增强模式TFT,这些晶体管表现出出色的性能;然而,组成变化和缺陷会不利地影响膜质量,特别是在电性能方面。在这项研究中,我们使用热激励电流(TSC)光谱来表征PLD生长的IGZO薄膜的电性能和深陷阱。发现生长的样品的直流活化能为0.62 eV,两个主要陷阱的活化能分别为〜0.16-0.26 eV和〜0.90 eV。但是,生长的样品中有时会存在强的持久光电流(PPC),因此我们进行了生长后退火,以减轻这种影响。发现在氩气中退火会增加传导,产生更多的PPC,并且还使更多的陷阱可见。在空气中进行退火可使薄膜更具电阻性,并去除PPC和除一个以外的所有陷阱。这项工作表明基于电流的陷阱发射(例如与TSC相关的陷阱发射)可以有效地揭示高电阻半导体材料中的电子缺陷,尤其是那些不适用于基于电容的技术的缺陷,例如深层瞬态光谱法(DLTS) )。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号