首页> 外文会议>応用物理学会春季学術講演会;応用物理学会 >X-ray optical sectioning microscopy: towards visualization of buried function layers andinterfaces in thin films (I)
【24h】

X-ray optical sectioning microscopy: towards visualization of buried function layers andinterfaces in thin films (I)

机译:X射线光学切片显微镜:用于观察薄膜中埋藏的功能层和界面(I)

获取原文

摘要

Periodically-packed multilayers play an important role in many material systems includingsemiconductors, magnets and optical devices. Generally speaking, performance of these materials aremostly determined by the perfect periodicity of multilayers and the homogeneity of every layer. Therefore,defects such as inhomogeneous impurity and layer distortion may dramatically decrease the performance,and hence they should be carefully inspected and specially discussed. However, because every buriedfunction layer is generally only a few nanometers thick, it is very difficult to detect the exact depth of thedefects in a non-destructive way. For this reason, we developed a new technique of X-ray optical sectioningmicroscopy.
机译:周期性填充的多层膜在包括半导体,磁体和光学器件在内的许多材料系统中都起着重要作用。一般而言,这些材料的性能主要取决于多层的完美周期性和每一层的均匀性。因此,不均匀杂质和层变形等缺陷可能会大大降低性能,因此应仔细检查并进行专门讨论。但是,由于每个掩埋功能层通常仅几纳米厚,因此以无损方式检测缺陷的确切深度非常困难。因此,我们开发了一种X射线光学切片显微镜的新技术。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号