首页> 外国专利> METHOD FOR FABRICATING A MULTILAYERED ENCAPSULATION THIN FILM WITH OPTICAL FUNCTIONALITY AND THE MULTILAYERED ENCAPSULATION THIN FILM FABRICATED BY THE SAME, USING REFLECTION BARRIER FILM BY CONTROLLING REFRACTIVITY DISTRIBUTION

METHOD FOR FABRICATING A MULTILAYERED ENCAPSULATION THIN FILM WITH OPTICAL FUNCTIONALITY AND THE MULTILAYERED ENCAPSULATION THIN FILM FABRICATED BY THE SAME, USING REFLECTION BARRIER FILM BY CONTROLLING REFRACTIVITY DISTRIBUTION

机译:通过控制反射率分布来使用反射阻挡膜来制造具有光学功能的多层封装薄膜和由相同的制造的多层封装薄膜的方法

摘要

PURPOSE: A method for fabricating a multilayered encapsulation thin film having optical functionality and the multilayered encapsulation thin film fabricated by the same are provided to easily form the multilayered encapsulation thin film with the different density and the refractivity by performing the reactive or non-reactive PVD process.;CONSTITUTION: A physical vapor deposition apparatus includes a plurality of targets in one vacuum chamber. A first thin film(2) is formed on the substrate(1) with the reactive or the non-reactive PVD process, using a part of target in the vacuum chamber. A second thin film(3) is formed on the first thin film with the reactive or non-reactive PVD process, using the other target within the vacuum chamber.;COPYRIGHT KIPO 2010
机译:目的:提供一种具有光学功能的多层封装薄膜的制造方法和由其制成的多层封装薄膜,以通过进行反应性或非反应性PVD而容易地形成具有不同密度和折射率的多层封装薄膜。组成:一种物理气相沉积设备,在一个真空室内包含多个靶材。利用真空室中的一部分靶,通过反应性或非反应性PVD工艺在衬底(1)上形成第一薄膜(2)。使用真空室内的另一个靶材,通过反应性或非反应性PVD工艺在第一薄膜上形成第二薄膜(3)。COPYRIGHTKIPO 2010

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