X-ray optical sectioning microscopy: towards visualization of buried function layers andinterfaces in thin films (Ⅱ)

摘要

A new technique of X-ray optical sectioning microscopy is developed to non-destructively detect theexact position and depth of defects in periodically-packed multilayers, because the defects such asinhomogeneous impurity and layer distortion may dramatically decrease the performance of multilayermaterials. It has been proved that this new technique of microscopy has a nano-level depth resolution and itis especially sensitive to buried function interface. It is going to be applied to many material systems suchas magnets, optical-devices, Q-state semiconductors preparation, 2D materials and so on.