Structure-property relationship in acetal-based chemically amplified three-component DUV resist

摘要

Abstract: AZ DX series are chemically amplified, three componentresists based on apoly(4-hydroxystyrene-co-3-methyl-4-hydroxystyrene)matrix resin, a poly(N,O-acetal) dissolution inhibitor,and a bis(arylsulfonyl)diazomethane acid generator. Thepreviously described AZ DX 46 is an environmentally anddelay time stable, high performance resist capable oflineating structures down to 0.23 $mu@m. The materialcontains a photoactive base to reduce the delay timeeffects. In this paper the influence of styrene unitsin the matrix resin, and some new polyacetals on theperformance of the resist in comparison to the abovementioned standard formulation AZ DX 46. !8