首页> 外文会议>26th International Symposium for Testing and Failure Analysis, Nov 12-16, 2000, Bellevue, Washington >Contrast Inversions in Scanning Acoustic Microscopy (C-SAM) of Glue Die Attach
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Contrast Inversions in Scanning Acoustic Microscopy (C-SAM) of Glue Die Attach

机译:胶模附着的扫描声显微镜(C-SAM)中的对比度倒置

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摘要

The quality of the die attach is crucial for almost all power devices, as in most cases thermal and electrical transport is vertical through the die and its backside. For glue inspection, C-SAM through the lead frame is widely used. Ordinarily, one of the three following states of delamination is found: (A) no delamination, (B) delamination at the die, or (C) delamination at the lead frame. A general rule for the assignment of the brightness in C-SAM amplitude images to these states of delamination cannot be given. This is evidenced by contrast inversions observed with frequency variation of the applied ultrasound or variation of the glue thickness. Contrast inversions at images through the lead frame occur between areas of states (A) and (B). The calculation of ultrasonic echoes for a three-layer model (copper, glue, silicon) shows that the contrast inversions are connected to the first resonance of the glue in state (B). Here complicated shapes of the echoes are found in experiments and calculations, which helps to correctly assign brightness levels to delamination states. Additionally a flow for reliable glue investigation with the use of through-transmission SAM inspection is proposed.
机译:芯片附着的质量对于几乎所有功率器件都是至关重要的,因为在大多数情况下,热和电传输是垂直穿过芯片及其背面的。对于胶水检查,通过引线框架的C-SAM被广泛使用。通常,发现以下三种分层状态之一:(A)无分层,(B)芯片上的分层,或(C)引线框架上的分层。无法给出将C-SAM振幅图像中的亮度分配给这些分层状态的一般规则。这可以通过在施加的超声波的频率变化或胶水厚度变化时观察到的对比度反转来证明。通过引线框的图像处的对比度反转发生在状态(A)和(B)的区域之间。对于三层模型(铜,胶,硅)的超声回波的计算表明,对比度反转与状态(B)下胶的第一共振有关。在这里,在实验和计算中发现了复杂形状的回声,这有助于正确地将亮度级别分配给分层状态。另外,提出了使用透射式SAM检查进行可靠胶水调查的流程。

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