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Design of an improved bandgap reference in 180nm CMOS process technology

机译:180nm CMOS工艺技术中改进的带隙基准的设计

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This paper grants implementation and design of Bandgap reference circuit with 0.2ppm/ low temperature coefficient in 180nm CMOS process technology. The designed circuit achieves a simulated output voltage reference of 1.12V at room temperature (27°C) with the temperature range of -40°C to +125°C under supply voltage of 1.8V. The power consumption is 52.37uW at room temperature and active area is 81.4um*63.43um. The designed circuit was implemented using Cadence Virtuoso and simulated using Spectre ADE.
机译:本文对180nm CMOS工艺技术中具有0.2ppm /低温系数的带隙基准电路的实现和设计进行了授权。设计的电路在室温(27°C),电源电压为1.8V,温度范围为-40°C至+ 125°C的情况下实现了1.12V的模拟输出电压基准。室温下功耗为52.37uW,有效面积为81.4um * 63.43um。设计的电路使用Cadence Virtuoso实现,并使用Spectre ADE进行仿真。

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