首页> 外文会议>2014 IEEE 36th International Electronic Manufacturing Technology Conference >Palladium coated copper wire — Characteristics and wire behavior in BSOB process and it's reliability performance
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Palladium coated copper wire — Characteristics and wire behavior in BSOB process and it's reliability performance

机译:镀钯铜线— BSOB工艺中的特性和线行为及其可靠性能

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The successful introduction of copper wire to semiconductor industry had a significant impact on the manufacturing cost thus copper wire which is 60%-70% cheaper than gold as an interconnecting material between die and lead have become the preferred wire for new devices and conversion status for semiconductor companies indicate that migration from gold to copper wire is a major accomplishment. In addition to this, reliability of devices which could not pass MSL-1 at 260 deg C requirement owing to development of kerkendall voiding (which results from very fast IMC growth rate especially after TC500 cycles) have been overcome. But as compared to quality responses and manufacturability, especially on BSOB wirebond process (Bond-stitch on ball) copper wire had been found out also to be more susceptible to issues like lifted ball, cratering and stitch problems (short tail, lifted stitch) as that of gold wire process. So the cost savings is not justifiable because of quality issues. Most of the issues have been attributed mainly due to the fast oxidation characteristics of the copper wire itself and its free air ball, although newer copper kit designs with nitrogen supply focused on free air ball and bond pad area have been developed, the issues had not been mitigated as wirebonding is still done at elevated temperatures. Studies have been conducted across the industry and most of the solution presented is to coat the copper wire material with Palladium, thus the introduction of CuPd wire (Palladium coated copper wire). A CuPd wire still maintains the electrical characteristics of the copper (lower resistivity than gold, copper core at 99.99%) while palladium as a noble metal prevents oxidation of the copper wire. The wire cost is 2-3 times that of a bare copper but still much cheaper as compared to gold wire. This paper aims to provide the results of studies conducted on a CuPd wire on a DFN package of 0.50mm package thickness which was done in conjunction with bare cop- er wire utilizing a BSOB process. Study was focused on the free air ball, distribution of palladium after electro flame-off application, bondability for 1st and 2nd bond, oxidation response and reliability tests. The results of studies will show the difference between CuPd wire bare copper wire and why reliability failure was encountered on the bare copper BSOB and not on the CuPd BSOB.
机译:铜线成功引入半导体行业对制造成本产生了重大影响,因此,铜作为裸片和铅之间的互连材料比黄金便宜60%-70%的铜线已成为新设备和转换状态的首选导线。半导体公司指出,从金到铜线的迁移是一项重大成就。除此之外,还克服了由于产生kerkendall空隙(这是由于IMC的快速增长,特别是在TC500循环之后)导致的无法在260℃通过MSL-1的设备的可靠性。但是,与质量响应和可制造性相比,尤其是在BSOB引线键合工艺(在球上进行键合缝制)时,发现铜线也更容易受到诸如提起球,缩孔和针迹问题(短尾巴,提针)的困扰。金线工艺。因此,由于质量问题,节省成本是不合理的。大多数问题主要归因于铜线本身及其自由空气球的快速氧化特性,尽管已经开发出了以自由空气球和键合焊盘区域为重点的较新的铜套件设计,其氮气供应,但问题并未得到解决。由于仍然在高温下进行引线键合,因此可以缓解这种情况。整个行业已经进行了研究,提出的大多数解决方案是用钯涂覆铜线材料,因此引入了CuPd线(涂覆钯的铜线)。 CuPd导线仍保持铜的电气特性(电阻率比金低,铜芯电阻为99.99%),而钯作为贵金属可防止铜线氧化。电线的成本是裸铜线的2-3倍,但与金线相比仍然便宜得多。本文旨在提供在厚度为0.50mm的DFN封装上的CuPd导线上进行的研究结果,该研究是与采用BSOB工艺的裸铜线一起完成的。研究的重点是自由空气球,电喷镀后钯的分布,第一键和第二键的粘合性,氧化反应和可靠性测试。研究结果将显示CuPd导线裸铜线之间的差异,以及为什么在裸铜BSOB而非CuPd BSOB上会遇到可靠性故障。

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