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Palladium coated copper wire — Characteristics and wire behavior in BSOB process and it's reliability performance

机译:钯涂层铜线 - BSOB过程中的特点和电线行为及其可靠性性能

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The successful introduction of copper wire to semiconductor industry had a significant impact on the manufacturing cost thus copper wire which is 60%-70% cheaper than gold as an interconnecting material between die and lead have become the preferred wire for new devices and conversion status for semiconductor companies indicate that migration from gold to copper wire is a major accomplishment. In addition to this, reliability of devices which could not pass MSL-1 at 260 deg C requirement owing to development of kerkendall voiding (which results from very fast IMC growth rate especially after TC500 cycles) have been overcome. But as compared to quality responses and manufacturability, especially on BSOB wirebond process (Bond-stitch on ball) copper wire had been found out also to be more susceptible to issues like lifted ball, cratering and stitch problems (short tail, lifted stitch) as that of gold wire process. So the cost savings is not justifiable because of quality issues. Most of the issues have been attributed mainly due to the fast oxidation characteristics of the copper wire itself and its free air ball, although newer copper kit designs with nitrogen supply focused on free air ball and bond pad area have been developed, the issues had not been mitigated as wirebonding is still done at elevated temperatures. Studies have been conducted across the industry and most of the solution presented is to coat the copper wire material with Palladium, thus the introduction of CuPd wire (Palladium coated copper wire). A CuPd wire still maintains the electrical characteristics of the copper (lower resistivity than gold, copper core at 99.99%) while palladium as a noble metal prevents oxidation of the copper wire. The wire cost is 2-3 times that of a bare copper but still much cheaper as compared to gold wire. This paper aims to provide the results of studies conducted on a CuPd wire on a DFN package of 0.50mm package thickness which was done in conjunction with bare cop- er wire utilizing a BSOB process. Study was focused on the free air ball, distribution of palladium after electro flame-off application, bondability for 1st and 2nd bond, oxidation response and reliability tests. The results of studies will show the difference between CuPd wire bare copper wire and why reliability failure was encountered on the bare copper BSOB and not on the CuPd BSOB.
机译:成功引入半导体工业的铜线对制造成本的显着影响,因此铜线比金的铜线比金币更便宜,因为模具和铅之间的互连材料已成为新设备的优选电线和转换状态半导体公司表明,从黄金迁移到铜线是一个重大成就。除此之外,由于克服了Kerkendall空缺的发展,在260℃下不能通过MSL-1的设备的可靠性(特别是在TC500循环之后的非常快的IMC生长速率)。但与质量响应和可制造性相比,特别是在BSOB线键工艺(球上的粘结针)上,已经发现铜线也更容易受到提升的球,起火艇和针迹问题(短尾,抬起针脚)等问题。金线流程。因此,由于质量问题,节省成本不合理。大多数问题主要是由于铜线本身的快速氧化特性及其自由空气球,虽然较新的铜套件设计与氮气供应的设计集中在自由空气球和粘接垫区域,但这些问题没有由于Wiuterbonding仍然在高温下进行了减轻。在整个行业进行了研究,提出的大部分解决方案是用钯涂覆铜线材料,从而引入Cupd(钯涂覆的铜线)。 CUPD线仍然保持铜的电特性(比金,铜芯在99.99%的铜芯下),而钯作为贵金属防止铜线的氧化。电线成本是裸铜的2-3倍,但与金线相比,仍然更便宜。本文旨在提供在0.50mm封装厚度的DFN封装上进行的研究结果,该封装厚度与利用BSOB过程的裸COP-ER线一起完成。研究专注于自由气球,电燃烧后钯的分布,粘结性第一和第二键,氧化反应和可靠性试验。研究结果将显示Cupd裸铜线之间的差异,为什么裸铜Bsob上遇到可靠性故障,而不是在Cupd Bsob上。

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