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Copper wire bond strength reliability assessment

机译:铜线键合强度可靠性评估

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Experiments have been completed on dependence of the wire pull strength on aging duration in TCB(Temperature Cycle B), HTS(High Temperature Storage), uHAST(unbiased Highly Accelerated Stress Test), THS(Temperature Humidity Soaking), and PCT(Pressure Cooker Test) for non-molded bare Cu and Pd coated Cu wire bonded devices. The data can be summarized as follows: 1. Bare Cu is less robust to temperature cycling than Pd coated wire. 2. There was no significant difference between the two types of wires when exposed to either THS or HTS as no interfacial degradation was found for aging up to 1000 hours in either stress condition. 3. In both uHAST and PCT degradation of the interface was observed. In both stress tests more ball lifts were observed for bare Cu than for Pd coated Cu. However the time for onset of ball lift failures was the same for both wires. Finally the wire strength degradation was more severe for the Pd coated Cu than for the bare Cu. We interpret these results to be related to electrochemical degradation of the IMCs and of the wire itself.
机译:在TCB(温度周期B),HTS(高温存储),uHAST(无偏高加速应力测试),THS(温度湿度浸泡)和PCT(压力锅)中,拉丝强度与老化时间的关系已经完成实验测试)用于未模制的裸露的Cu和Pd涂层的Cu引线键合器件。数据可归纳如下:1.裸铜在温度循环方面不如Pd涂覆线强。 2.当暴露于THS或HTS中时,两种类型的线材之间无显着差异,因为在任何一种应力条件下老化1000小时均未发现界面降解。 3.在uHAST和PCT中均观察到界面降解。在两种应力测试中,裸露的铜比镀钯的铜观察到更多的球升力。但是,两条导线的起球故障发生的时间相同。最终,镀钯的铜的线强度劣化比裸露的铜严重得多。我们将这些结果解释为与IMC和导线本身的电化学降解有关。

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