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Quantum modeling of electron confinement in double triangular quantum well formed in nanoscale symmetric double-gate InAlAs/InGaAs/InP HEMT

机译:纳米对称双栅InAlAs / InGaAs / InP HEMT中形成的双三角量子阱中电子约束的量子建模

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The electron confinement in double triangular quantum wells (DTQW) in nanoscale symmetric Double gate InAlAs/InGaAs/InP HEMT (DGHEMT) has been modeled and simulated including quantum effects at gate lengths (Lg) 100nm and 50nm. The trend towards thinner channel and shorter gate lengths is resulting in increased importance of quantum effects, as many of the semi-classical assumptions become invalid. At nanoscale-dimensions, there is a need to imagine the carriers as particle-waves rather than semi-classical particle and it becomes imperative to study the electron confinement in the channel quantum mechanically instead of semi-classically. The standard approach being followed earlier has been within semi-classical framework for a double gate InAlAs/InGaAs/InP HEMT. Most of the quantum simulations have been performed for single gate HEMT [1]. DGHEMT are very promising for high frequency [2] and low noise applications and hence quantum modeling of this device is required. This paper introduces a quantum model to investigate the DTQW consisting of two single triangular quantum wells formed in semiconductor InGaAs sandwiched between layers of InAlAs material with a wider bandgap. The quantum model used to simulate the channel confinement is Quantum Moments (Density Gradient) Model which accurately reproduces the carrier concentration in the channel. In order to facilitate our study at 50nm, the vertical dimensions are not scaled down when reducing Lg from 100nm to 50nm. Simulated structure of symmetric DGHEMT is shown in Fig.1, device dimensions are given in Table. I and electron concentration profiles in DTQW at (Lg) 100nm and 50nm are shown in Fig. 2 and Fig. 3 Comparison with the semi-classical model predicts that at nanodimensions, the effects of quantum confinement become so pronounced that the double triangular quantum well formed in the channel seems to behave as a single quantum well and shows the peak electron concentration at th-n centre of the channel. To conclude, the quantization of electron confinement in DTQW in nanoscale DGHEMT has been modeled by a quantum moments model and it can be seen that the peak electron concentration exists at the two channel interfaces with the spacer layers in semi-classical representation while quantum model shows the maximum electron concentration in the centre of the channel indicating double triangular quantum wells behaving as a single quantum well. Also Drain characteristics (Id-Vds) comparing semi-classical and quantum models with experimental results [3] have been shown in Fig. 4 for Lg=100nm, keeping Vgs constant at −0.1V and plotting Id as a function of Vds respectively. The proposed quantum model shows a good matching with the experimental results [3] in the linear region with only a slight reduction in the saturation current is observed in the quantum model. For DGHEMT having their gate lengths in the nanometric scale, our simulation emphasizes on the importance of quantum modeling of the channel so as to have a proper representation of the nanodimension device.
机译:对纳米级对称双栅InAlAs / InGaAs / InP HEMT(DGHEMT)中双三角量子阱(DTQW)中的电子约束进行了建模和模拟,包括栅长度(L g )在100nm和50nm处的量子效应。随着许多半经典假设变为无效,趋向于更薄的沟道和更短的栅极长度的趋势导致了量子效应的重要性日益提高。在纳米尺度上,需要将载流子想象成粒子波而不是半经典粒子,因此必须从机械上而不是半经典地研究沟道量子中的电子约束。较早采用的标准方法是在双门InAlAs / InGaAs / InP HEMT的半经典框架内。大多数量子模拟都是针对单门HEMT [1]进行的。 DGHEMT对于高频[2]和低噪声应用非常有前途,因此需要对该器件进行量子建模。本文介绍了一种量子模型,以研究由半导体InGaAs中形成的两个单三角量子阱组成的DTQW,该阱夹在具有较宽禁带的InAlAs材料层之间。用于模拟通道限制的量子模型是量子矩(密度梯度)模型,该模型可以精确地再现通道中的载流子浓度。为了便于我们在50nm处进行研究,将L g 从100nm减小到50nm时,垂直尺寸未按比例缩小。对称DGHEMT的仿真结构如图1所示,器件尺寸如表所示。图2和图3显示了在(L g )100nm和50nm处DTQW中的I和电子浓度分布图。与半经典模型的比较表明,在纳米尺度上,量子约束的影响变得如此明显地表明,在通道中形成的双三角量子阱似乎表现得像单量子阱,并在通道的th-n中心显示出峰值电子浓度。总而言之,已经用量子矩模型对纳米级DGHEMT中DTQW中电子约束的量化进行了建模,可以看出,峰值电子浓度存在于半间隔表示的间隔层的两个通道界面处,而量子模型显示通道中心的最大电子浓度表明双三角形量子阱表现为单个量子阱。此外,对于L g,将半经典模型和量子模型与实验结果[3]进行比较的漏极特性(I d -V ds )也显示在图4中。 = 100nm,将V gs 保持恒定在-0.1V,并将I d 分别绘制为V ds 的函数。所提出的量子模型在线性区域显示出与实验结果[3]的良好匹配,在量子模型中仅观察到饱和电流的轻微降低。对于其栅极长度在纳米级的DGHEMT,我们的仿真强调通道量子建模的重要性,以便正确表示纳米尺寸器件。

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