首页> 外文会议>2008 International Workshop on Junction Technology(第六届结技术国际研讨会) >Influence of Emitter Ledge Width on the Characteristics of InGaP/GaAs Heterojunction Bipolar Transistors
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Influence of Emitter Ledge Width on the Characteristics of InGaP/GaAs Heterojunction Bipolar Transistors

机译:发射极壁架宽度对InGaP / GaAs异质结双极晶体管特性的影响

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摘要

A comprehensive study of the inGaP ledge width effect on the performance of InGaP/GaAs heterojunction bipolar transistors (HBTs) is demonstrated. It is shown that the electron density and recombination rate at the surface channel are decreased with increasing the InGaP ledge width. However, the longer InGaP ledge width increases the base-collector junction area which in turn deteriorates the high frequency performance. According to the theoretical analysis and experimental results, the device with an InGaP ledge width of 0.8 μm shows the best and acceptable DC and RF performance.
机译:全面研究了InGaP壁架宽度对InGaP / GaAs异质结双极晶体管(HBT)性能的影响。结果表明,随着InGaP壁架宽度的增加,表面沟道的电子密度和复合率降低。但是,较长的InGaP壁架宽度会增加基极-集电极的结面积,进而降低高频性能。根据理论分析和实验结果,InGaP壁架宽度为0.8μm的器件显示出最佳和可接受的DC和RF性能。

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    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan,TAIWAN 70101, Republic of China;

    Department of Electronic Engineering, National Ilan University, No.1, Sec.1, Sheng-Lung Road, I-Lan, TAIWAN 26041, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan,TAIWAN 70101, Republic of China;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan,TAIWAN 70101, Republic of China;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan,TAIWAN 70101, Republic of China;

    Department of Electronic Engineering, Nationa;

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