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Influence of emitter-ledge thickness on the surface- recombination mechanism of InGaP/GaAs heterojunction bipolar transistor

机译:发射极-壁厚对InGaP / GaAs异质结双极晶体管的表面复合机理的影响

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摘要

In this work, the characteristics of InGaP/GaAs heterojunction bipolar transistors (HBTs) with various emitter-ledge thicknesses are comprehensively studied and demonstrated. Based on the two-dimensional analysis, some important parameters such as the recombination rate and DC characteristics are studied. The simulated analyses are in good agreement with experimental results. It is known that better HBT performance, including lower recombination rate in the surface channel, and higher DC current gain are obtained in the studied devices with the emitter ledge thickness between 100 and 200 A.
机译:在这项工作中,对具有各种发射极-壁厚的InGaP / GaAs异质结双极晶体管(HBT)的特性进行了全面的研究和论证。在二维分析的基础上,研究了复合率和直流特性等重要参数。模拟分析与实验结果吻合良好。众所周知,在研究的器件中,发射器壁架厚度在100至200 A之间时,可以获得更好的HBT性能,包括较低的表面通道复合率和较高的DC电流增益。

著录项

  • 来源
    《Superlattices and microstructures》 |2008年第4期|368-374|共7页
  • 作者单位

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Department of Electronic Engineering, Nation Ilan University, No.1, Sec.1, Shen-Lung Road, I-Lan, 26041, Taiwan, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, 70101, Taiwan, ROC;

    Department of Electronic Engineering, Nation Ilan University, No.1, Sec.1, Shen-Lung Road, I-Lan, 26041, Taiwan, ROC;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    emitter-ledge thickness; recombination rate; DC current gain;

    机译:发射器-壁架厚度;重组率直流电流增益;

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