Faculty of Systems Engineering, Shibaura Institute of Technology 307 Fukasaku, Minuma-ku, Saitama, 337-8570, Japan;
Faculty of Systems Engineering, Shibaura Institute of Technology 307 Fukasaku, Minuma-ku, Saitama, 337-8570, Japan;
Faculty of Systems Engineering, Shibaura Institute of Technology 307 Fukasaku, Minuma-ku, Saitama, 337-8570, Japan;
Passivation; Aluminum gallium nitride; Wide band gap semiconductors; HEMTs; MODFETs; Logic gates; High-k dielectric materials;
机译:低k /高k双钝化层AlGaN / GaN Hemts中击穿电压分析
机译:缓冲漏电流对具有高k钝化层的AlGaN / GaN HEMT中击穿特性的影响
机译:高k钝化层拆下击穿电压对栅极排水距离的依赖性分析
机译:双钝化层的AlGaN / GaN Hemts击穿特性分析
机译:GaN-SiC界面处具有GaN微坑的AlGaN / GaN HEMT中的散热分析
机译:使用AlGaN / GaN / AlGaN量子阱电子阻挡层的AlGaN / GaN HEMT中的高击穿电压
机译:用低 - $ {k} $ / high - $ {k} $双钝化层分析AlGaN / GaN Hemts中的击穿电压分析