Department of Electronic Engineering, Xi'an University of Technology, Xi'an, CHINA;
Department of Electronic Engineering, Xi'an University of Technology, Xi'an, CHINA;
Department of Electronic Engineering, Xi'an University of Technology, Xi'an, CHINA;
electric breakdown; p-i-n diodes; silicon compounds; wide band gap semiconductors;
机译:具有不同结终端结构的15kV级4H-SiC PiN二极管的击穿特性
机译:适用于15 kV 4H-SiC PiN二极管的各种结终止结构的实验研究
机译:4.5kV20mΩ.cm〜2无注入4H-SiC BJT,在结终端扩展上具有沟槽结构
机译:具有3.3kV SiC引脚二极管的FLR和沟槽的新终端结构
机译:4H-SIC沟槽MOSFET:实用的表面沟道迁移率提取
机译:通过SiCN / SiC超晶格结构增强Si纳米晶体发光二极管的电子传输和发光效率
机译:用OCVD技术测量3.3kV 4H-siC piN二极管载流子寿命温度的依赖性