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A new termination structure with FLR and trench for 3.3kV SiC PiN diode

机译:用于3.3kV SiC PiN二极管的具有FLR和沟槽的新型端接结构

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摘要

A novel termination structure with field limit ring (FLR) and trench for 3.3kV 4H-SiC PiN diode is proposed in this paper. The blocking mechanism and characteristic are analyzed by 2D numerical simulation. The results show that compared with the conventional FLR structure, the higher breakdown voltage can be obtained under the smaller termination size with the proposed termination structure, the electric field distribution of each FLR is uniform and the peak electric field intensity is in a range between 1.7 MV/cm to 2.4 MV/cm. As a result, the robustness of the proposed termination structure can be improved.
机译:提出了一种新型的带有3.3kV 4H-SiC PiN二极管的场限制环和沟槽的端接结构。通过二维数值模拟分析了其阻塞机理和特性。结果表明,与传统的FLR结构相比,采用所提出的端接结构,可以在较小的端接尺寸下获得较高的击穿电压,每个FLR的电场分布均匀,峰值电场强度在1.7至1.7之间。 MV / cm至2.4 MV / cm。结果,可以提高所提出的端接结构的鲁棒性。

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