首页> 外国专利> SHIELDED GATE TRENCH MOSFET HAVING SUPER JUNCTION SURROUNDING LOWER PORTION OF TRENCHED GATES

SHIELDED GATE TRENCH MOSFET HAVING SUPER JUNCTION SURROUNDING LOWER PORTION OF TRENCHED GATES

机译:屏蔽栅极沟槽MOSFET,具有围绕挖沟门的下部的超结

摘要

An SGT MOSFET having super junction surrounding lower portion of trenched gates is disclosed. The super junction structure is surrounding lower portion of trenched gates to ensure whole drift region is fully depleted and breakdown occurs at middle of adjacent trenched gates without having early breakdown occurring at trench bottom. Moreover, sensitivity of breakdown voltage on trench bottom oxide thickness and trench depth is significantly relaxed or immune. Avalanche capability is also enhanced.
机译:公开了一种具有围绕沟槽闸门下部的超结的SGT MOSFET。 超结结构周围围绕沟槽闸门的下部,以确保整个漂移区域完全耗尽,并且在相邻的挖沟门的中间发生故障,而不在沟槽底部发生早期击穿。 此外,沟槽底部氧化物厚度和沟槽深度对击穿电压的灵敏度显着松弛或免疫。 雪崩功能也得到增强。

著录项

  • 公开/公告号US2021384346A1

    专利类型

  • 公开/公告日2021-12-09

    原文格式PDF

  • 申请/专利权人 NAMI MOS CO. LTD.;

    申请/专利号US202016891105

  • 发明设计人 FU-YUAN HSIEH;

    申请日2020-06-03

  • 分类号H01L29/78;H01L29/06;H01L29/40;H01L29/66;

  • 国家 US

  • 入库时间 2022-08-24 22:42:34

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