Selective film deposition method on substrate, substrate surface region of substrate, deposited film of organic matter and organic matter

摘要

The selective film deposition method for the metal surface region of the substrate of the present disclosure includes a first surface region containing a metal and a second surface region containing non-metallic inorganic material and / or metal oxide, and the first surface region of the substrate than the second surface region A method of selectively depositing a film of organic substance represented by the following general formula (1).In formula (1), n is a nitrogen atom, and X is an oxygen atom or a sulfur atom.R1 is a hydrocarbon group that may have a heteroatom and a halogen atom of 2 to 12 carbon atoms, and R2, R3, and R4 are independently hydrocarbon groups having a hydrogen atom or a ring of 1 to 10 carbon atoms, a heteroatom or a halogen atom. However, the hydrocarbon group includes a branched or cyclic hydrocarbon group in the case where the number of carbon is 3 or more.[1](1)