SUBSTRATE, SELECTIVE METHOD FOR ACCUMULATING FILM ON METAL SURFACE REGION OF SUBSTRATE, ACCUMULATED FILM OF ORGANIC MATTER, AND ORGANIC MATTER

摘要

This selective method for accumulating a film on a metal surface region of a substrate is characterized in that a film of organic matter represented by general formula (1) is selectively accumulated on a substrate having a structure in which both of a first surface region that includes metal and a second surface region that includes a non-metal inorganic material and/or a metal oxide are exposed, the film being accumulated to a greater extent in the first surface region than in the second surface region. (In general formula (1), N represents a nitrogen atom, and X represents an oxygen atom or a sulfur atom. R¹ represents a C2-12 hydrocarbon group that may have a hetero atom or a halogen atom, and R², R³, and R⁴ each independently represent a hydrogen atom or a C1-10 hydrocarbon group that may have a hetero atom or a halogen atom. In the case of a C3 or higher hydrocarbon group, a branched or cyclic hydrocarbon group is also included.)