SUBSTRATE, SELECTIVE FILM DEPOSITION METHOD, DEPOSITION FILM OF ORGANIC MATTER, AND ORGANIC MATTER

摘要

This selective film deposition method is characterized in that a film of organic matter represented by general formula (1) is selectively deposited on a substrate having a structure in which both a first surface region, which contains a metal and/or a metal oxide, and a second surface region, which contains a nonmetal inorganic material, are exposed, the film being deposited to a greater extent in the first surface region than on the second surface region. (In general formula (1), N is a nitrogen atom. (In general formula (1), N is a nitrogen atom. R¹ is a C1-C30 hydrocarbon group optionally having a heteroatom or halogen atom, R², R³, R⁴ and R⁵ are independently a hydrogen atom or a C1-C10 hydrocarbon group optionally having a heteroatom or a halogen atom. However, in the case of a C3 or higher hydrocarbon group, a branched or cyclic hydrocarbon group is also included.)