Substrate, selective film deposition method for the metal surface area of the substrate, organic material deposition film and organic material

摘要

The selective film deposition method for the metal surface area of the substrate of the present disclosure has a structure in which both a first surface area including a metal and a second surface area including a non-metallic inorganic material and/or metal oxide are exposed. This method is characterized in that, with respect to the substrate, a film of an organic material represented by the following general formula (1) is selectively deposited on the first surface region rather than the second surface region. (In the general formula (1), N is a nitrogen atom, X is an oxygen atom or a sulfur atom. R ¹ is a hydrocarbon group which may have a hetero atom or a halogen atom having 2 to 12 carbon atoms, and R ² , R ³ And R ⁴ are each independently a hydrogen atom, a ring having 1 to 10 carbon atoms, or a hydrocarbon group which may have a hetero atom or a halogen atom, provided that the hydrocarbon group is a branched or cyclic hydrocarbon group with 3 or more carbon atoms. Including prayer)