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RUNDUM-GATE FIELD EFFECT TRANSISTORS IN INTEGRATED SCHOLALS

机译:综合学者中的rundum门场效应晶体管

摘要

an integrated circuit (IC),which has a memory cell with a first active p-range, a first active n-range, a second active-range and a second active p-range. Both the first and the second active p-range each have a first group of vertically stacked channel layers with a width Wi, and both the first and second active n-range each have a second group of vertically stacked channel layers with a width W2,where the width W2 is smaller than the width W1. The IC structure also has a standard logic cell with a third n-Finnish and a third p-Finnish. The third n-Finne has a third group of vertically stacked channel layers which have a width W3, and the third p-Finne has a fourth group of vertically stacked channel layers which have a width W4, the width W3 being greater than or equal to the width W4.
机译:集成电路(IC),其具有第一有源P范围,第一有源N范围,第二有效范围和第二有源P范围的存储器单元。第一和第二有源P范围均具有具有宽度Wi的第一组垂直堆叠的通道层,并且第一和第二有源N范围都具有第二组垂直堆叠的沟道层,其宽度为W2,宽度W2小于宽度W1的情况下。 IC结构还具有标准逻辑单元,其中具有第三个n innish和第三个p-finnish。第三N-FINNE具有具有宽度W3的第三组垂直堆叠的通道层,并且第三P-FINNE具有具有宽度W4的第四组垂直堆叠的通道层,宽度W3大于或等于宽度W4。

著录项

  • 公开/公告号DE102020121306A1

    专利类型

  • 公开/公告日2021-07-01

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.;

    申请/专利号DE202010121306

  • 发明设计人 JHON JHY LIAW;

    申请日2020-08-13

  • 分类号H01L27/11;H01L27/092;

  • 国家 DE

  • 入库时间 2022-08-24 19:43:24

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