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Semiconductor devices, semiconductor device manufacturing methods and electronic devices

机译:半导体器件,半导体器件制造方法和电子设备

摘要

PROBLEM TO BE SOLVED: To enhance thermal conductivity between a substrate and a diamond layer provided therein. SOLUTION: A semiconductor device 1 exposes a substrate 10, an insulating layer 20 provided on the substrate 10, metal particles 30 groups provided so as to be exposed on a surface 20a of the insulating layer 20, and metal particles 30 groups. It includes a diamond layer 40 provided on the surface 20a of the insulating layer 20 to be formed. By adjusting the surface density and particle size of the metal particles 30 on the surface 20a of the insulating layer 20, the surface density of the diamond nuclei generated on the surface 20a is adjusted, and the diamond particles 43 are crystal-grown from the diamond nuclei. To obtain the diamond layer 40. By adjusting the surface density of the diamond nucleus, diamond particles 43 having a particle size showing relatively high thermal conductivity are crystal-grown in the initial crystal growth layer of the diamond layer 40, and heat conduction between the diamond layer 40 and the substrate 10 is achieved. Improve sex. [Selection diagram] Fig. 3
机译:要解决的问题:提高在其中提供的基板和金刚石层之间的导热率。溶液:半导体器件1暴露衬底10,设置在基板10上的绝缘层20,提供的金属颗粒30组,以暴露在绝缘层20的表面20a上,以及金属颗粒30组。它包括设置在待形成的绝缘层20的表面20a上的金刚石层40。通过将金属颗粒30的表面密度和粒度调节在绝缘层20的表面20a上,调节在表面20a上产生的金刚石核的表面密度,并且金刚石颗粒43是从金刚石种植的晶体生长核。为了获得金刚石层40.通过调节金刚石核的表面密度,具有显示相对高导热率的粒度的金刚石颗粒43在金刚石层40的初始晶体生长层中晶体生长,以及在实现金刚石层40和基板10。改善性别。 [选择图]图3

著录项

  • 公开/公告号JP2021034546A

    专利类型

  • 公开/公告日2021-03-01

    原文格式PDF

  • 申请/专利权人 富士通株式会社;

    申请/专利号JP20190152859

  • 发明设计人 矢板 潤也;山田 敦史;

    申请日2019-08-23

  • 分类号H01L21/314;H01L21/338;H01L29/778;H01L29/812;C23C16/27;C23C16/02;C23C14/14;

  • 国家 JP

  • 入库时间 2022-08-24 17:24:46

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