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method of electrolytic solution cuivrage not used.

机译:不使用电解溶液法。

摘要

A copper-plating bath comprises 0.02-0.25 mols. of a water-soluble copper sa 0.25-2.1 mols. of formaldehyde (or equivalent amount of paraformaldehyde or trioxan); 0.002-0.25 mols., but in amount less than that necessary to complex completely said copper salt, of a copper complexing salt selected from the group consisting of Rochelle salts, sodium gluconate and sodium citrate; alkali metal hydroxide from 5-7 times the number of mols. of the copper complexing salt and sufficient to give the bath a pH of at least 11.0; and water sufficient to give one litre of solution. Before plating, the substrate may be treated in solutions of stannous chloride, fluoborate or sulphate, and palladium chloride or auric chloride. Surfaces which may be copper-plated include plastics,
机译:镀铜浴包含0.02-0.25摩尔。水溶性铜盐; 0.25-2.1摩尔。甲醛(或等量的多聚甲醛或三恶烷); 0.002-0.25摩尔,但少于完全络合所述铜盐所需量的选自罗谢尔盐,葡萄糖酸钠和柠檬酸钠的铜络合盐;碱金属氢氧化物摩尔数的5-7倍。铜络合盐,足以使镀液的pH至少为11.0;和水足以产生一升的溶液。在电镀之前,可以在氯化亚锡,氟硼酸盐或硫酸盐以及氯化钯或氯化金的溶液中处理基材。可能镀铜的表面包括塑料,

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