The photographic camera with a double exposure lock and a exposure counter.

• 1. 在最后曝光之后延迟胶片回绕以进行胶片改写的双重胶片曝光、电子曝光相机 [P] . 中国专利： CN1314612A . 2001-09-26
• 2. 除了最后曝光的胶片之外具有对胶片多次改写功能的双重胶片曝光、电子曝光相机 [P] . 中国专利： CN1314613A . 2001-09-26
• 3. The photographic camera with a double exposure lock and a exposure counter [P] . 德国专利： DE1228141B . 1966-11-03

  机译： 带有双重曝光锁和曝光计数器的摄影机

• 4. Control mechanism for the elimination of double-exposures in photographic cameras [P] . 美国专利： US2722872A . 1955-11-08

  机译： 消除摄影机中双重曝光的控制机制

• 5. Locking device of a double exposure to a photographic camera [P] . 法国专利： FR1429159A . 1966-02-18

  机译： 相机双重曝光的锁定装置

• 1. Trimap generation for digital matting using camera exposure [J] . WANG Lu, OUYANG Binlin, LI Chengrong 东北农业大学学报（英文版） . 2007,第002期
• 2. Short-term environmental enrichment exposure induces proliferation and maturation of doublecortin-positive cells in the prefrontal cortex [J] . Chunling Fan, Mengqi Zhang, Lei Shang, 中国神经再生研究（英文版） . 2014,第003期
• 3. Characteristics of physical blocking on co-occupant's exposure to respiratory droplet residuals [J] . LI Xiao-ping, NIU Jian-lei, GAO Nai-ping 中南大学学报（英文版） . 2012,第003期
• 4. Rigorous Electromagnetic Field Simulation of Two-Beam Interference Exposures for the Exploration of Double Patterning and Double Exposure Scenarios [C] . Andreas Erdmann, Peter Evanschitzky, Tim Fuehner, Optical Microlithography XXI . 2008
• 5. Waste Electrical and Electronic Equipment and Efficiency Improvement Related to Solar Exposure by Limiting Thermal Degradation to Outdoor Surveillance Cameras [D] . Lozano, Rodolfo, IV. 2017
• 6. Optimization of camera exposure durations for multi-exposure speckle imaging of the microcirculation [O] . S. M. Shams Kazmi, Satyajit Balial, Andrew K. Dunn 2014
• 7. Note on an Apparatus for correcting the Driving of the Motor Clocks of large Equatorials for long Photographic Exposures [O] . A. A. Common 1889

• 1. Quantitative Measurement of the Exposure Response of Digital Cameras [J] . Caitlin R. Kunchur . 分析科学方法和仪器期刊（英文） . 2019,第3期
• 2. Maintained Exposure to Spring Water but Not Double Distilled Water in Darkness and Thixotropic Conditions to Weak (~1 #181;T) Temporally Patterned Magnetic Fields Shift Photon Spectroscopic Wavelengths: Effects of Different Shielding Materials [J] . N. J. Murugan ,L. M. Karbowski ,R. M. Lafrenie . 生物物理化学（英文） . 2015,第1期
• 3. 双重曝光：时尚摄影是艺术吗? [C] . Karen de Perthius ,卡伦·佩希尔斯 . 第三届（2016）时尚传播国际论坛 . 2016
• 4. UV-LED曝光系统及曝光工艺研究 [A] . 高轩 . 2016