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Free hold down of wafers for material removal

机译:自由压下晶圆以去除材料

摘要

Wafers have material removed from them in processes such as lapping or polishing without the use of hold down adhesives to secure the wafers to a wafer mounting plate. The front side of a polymeric mounting pad on a wafer mounting plate is moistened with a liquid, the wafers are rendered shedding of that liquid and substantially free of adhesion diminishing particles and powder and are mounted on the moistened mounting pad. It is critical that the wafers shed the liquid with which the pad is moistened. The wafers are pressed firmly against the mounting pad in order to assure their continued adhesion to the pad during the material removal process. The wafer mounting plate is then mounted in the lapping, polishing or other material removal machine and the wafers lapped or polished in a normal manner. After completion of the desired material removal the wafers may be removed from the mounting pad with tweezers or by floating the wafers off the mounting pad. The entire process is preferably performed at room temperature.
机译:在诸如研磨或抛光之类的过程中,晶圆上已去除了材料,而无需使用压紧粘合剂将晶圆固定到晶圆安装板上。用液体润湿晶片安装板上的聚合物安装垫的前侧,使晶片脱落该液体,并且基本上没有粘附力,从而减少了颗粒和粉末,并且将晶片安装在润湿的安装垫上。至关重要的是,晶圆应洒下润湿垫的液体。将晶片牢固地压在安装垫上,以确保在材料去除过程中将它们继续粘附到安装垫上。然后将晶片安装板安装在研磨,抛光或其他材料去除机中,以常规方式研磨或抛光晶片。在完成所需的材料去除之后,可以用镊子或通过将晶片浮离安装垫而将晶片从安装垫移除。整个过程优选在室温下进行。

著录项

  • 公开/公告号US4258508A

    专利类型

  • 公开/公告日1981-03-31

    原文格式PDF

  • 申请/专利权人 RCA CORPORATION;

    申请/专利号US19790072430

  • 发明设计人 WALLACE WILSON;FRANK J. EGENSKI;

    申请日1979-09-04

  • 分类号B24B1/00;

  • 国家 US

  • 入库时间 2022-08-22 14:48:09

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