A method for attaching a narrow groove or a gap in a substrate region, in particular a semiconductor substrate region

• 1. 原位检测衬底处理系统的衬底区域中的氧的系统和方法 [P] . 中国专利： CN107941757A . 2018-04-20
• 2. 制造半导体衬底的方法、半导体衬底、制造组合半导体衬底的方法、组合半导体衬底和半导体结合衬底 [P] . 中国专利： CN107112205A . 2017-08-29
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  机译： 在基体区域中，特别是在半导体基体区域中提供窄槽或狭槽的方法

• 4. Method of providing a narrow groove or slot in a substrate region, in particular a semiconductor substrate region [P] . 美国专利： US4449287A . 1984-05-22

  机译： 在衬底区域，特别是半导体衬底区域中提供窄槽或狭缝的方法

• 5. METHOD FOR INSULATING ACTIVE REGION OF SEMICONDUCTOR SUBSTRATE BY ALMOST FLAT AND NARROW GROOVE, AND CORRESPONDING DEVICE [P] . 日本专利： JPH0837232A . 1996-02-06

  机译： 用几乎平坦的沟槽和窄的沟槽绝缘半导体基体的有效区域的方法及相应的装置

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• 7. Process and System for Laser Crystallization Processing of Film Regions on a Substrate to Minimize Edge Areas, and a Structure of Such Film Regions [R] . Im, J. S. 2003

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