首页> 外国专利> PROTECTIVE SYSTEM OF COMPLEMENTARY METAL OXIDE SEMICONDUCTOR INTEGRATED CIRCUIT

PROTECTIVE SYSTEM OF COMPLEMENTARY METAL OXIDE SEMICONDUCTOR INTEGRATED CIRCUIT

机译:互补金属氧化物半导体集成电路保护系统

摘要

A protection system for CMOS integrated circuits to prevent inadvertent damage caused by electrostatic discharge includes a low impedance power supply bus structure and a plurality of bipolar and MOS clamping networks. The bipolar clamping networks are formed around each of the bonding pads for interlinking all of them together through the low impedance power supply bus structure. When any one of the bonding pads receives a higher voltage than a predetermined value and another remaining one of the bonding pads contacts a ground potential, current is routed from the one bonding pad through the low impedance power supply bus structure to the other bonding pad in order to discharge the same.
机译:用于防止由于静电放电引起的无意损坏的CMOS集成电路保护系统包括低阻抗电源总线结构以及多个双极和MOS钳位网络。双极钳位网络形成在每个键合焊盘周围,用于通过低阻抗电源总线结构将它们全部互连在一起。当任何一个接合垫接收到的电压高于预定值,而另一个接合垫中的另一个接触地电位时,电流从一个接合垫通过低阻抗电源总线结构流向另一个接合垫。为了放电一样。

著录项

  • 公开/公告号JPS63304656A

    专利类型

  • 公开/公告日1988-12-12

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICDS INC;

    申请/专利号JP19880115973

  • 申请日1988-05-12

  • 分类号H01L27/06;G11C11/401;H01L21/822;H01L21/8238;H01L27/02;H01L27/04;H01L27/092;H01L27/118;

  • 国家 JP

  • 入库时间 2022-08-22 06:45:01

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号