首页> 外国专利> Complementary metal oxide semiconductor/bipolar complementary metal oxide semiconductor - integrated circuit for camera chip has single individual layer as last layer of passivation system sealing off integrated circuit

Complementary metal oxide semiconductor/bipolar complementary metal oxide semiconductor - integrated circuit for camera chip has single individual layer as last layer of passivation system sealing off integrated circuit

机译:互补金属氧化物半导体/双极互补金属氧化物半导体-相机芯片集成电路具有单个单独的层作为钝化系统的最后一层,将集成电路密封

摘要

Only a single individual layer (2) is applied finally on the photosensitive area of the circuit, being the last layer of a passivation system (3; 2) sealing-off the integrated circuit. This layer (2) has a given optical thickness (d) for high transmission. (Optical thickness is defined thickness multiplied by refractive index). An Independent claim is included for the corresponding method of manufacture.
机译:最后,仅单个单独的层(2)被施加在电路的光敏区域上,是钝化系统(3; 2)的最后一层,其将集成电路密封。该层(2)具有给定的光学厚度(d)以用于高透射。 (光学厚度是指定义的厚度乘以折射率)。相应的制造方法包括独立权利要求。

著录项

  • 公开/公告号DE10239643B3

    专利类型

  • 公开/公告日2004-06-17

    原文格式PDF

  • 申请/专利权人 X-FAB SEMICONDUCTOR FOUNDRIES AG;

    申请/专利号DE2002139643

  • 发明设计人 BACH KONRAD;

    申请日2002-08-29

  • 分类号H01L31/0216;H01L21/314;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:56

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