Cathodic sputtering device comprising at least four targets using plasma produced by microwaves

摘要

A cathodic sputtering device using a plasma produced by microwaves comprises an even number, at least equal to 4, of targets (16 to 19) facing one another pairwise and defining a polyhedral cavity, the base of said cavity being free, magnets (21 to 24) for creating a magnetic field in the cavity, each magnet being positioned facing a target outside the cavity, at least one microwave antenna (25, 42, 44, 45) in said cavity in order to produce there a microwave discharge and also produce there a plasma by means of a plasma forming gas introduced into the cavity, as well as a substrate holder (20) facing the free base of the cavity for carrying a substrate to be coated with the material of the targets. Masks 16a, 17a, 18a, 19a may be associated with each target and means may be provided for rotating the substrate holder around its axis. The apparatus may be used for forming films for use in microelectronics and in optical devices. IMAGE