SINGLE TANK CLEANING APPARATUS AND METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a single tank cleaning equipment and a cleaning method which are excellent in cleaning effect. ;SOLUTION: This cleaning equipment is provided with the following: a cleaning tank 12, circulating piping 22 of chemical liquid which is arranged to circulate chemical liquid through the vessel 12, a circulating pump 14 which is installed in the circulating piping and circulates the chemical liquid, and a chemical liquid detector installed in the circulating piping in the vicinity of a circulating pump. A semiconductor substrate is effective cleaned by executing the following: a cleaning liquid-introducing step of introducing a cleaning liquid into the cleaning vessel 12 in which semiconductor substrates are arranged, the circulating piping 22 and the circulating pump 14, a circulating step of circulating the cleaning liquid in a circulating path constituted of the cleaning vessel, the circulating piping and the circulating pump, a pure water introducing/cleaning liquid discharging step of discharging the cleaning liquid in the circulating path constituted of the cleaning tank, the circulating piping and the circulating pump, while introducing pure water into the cleaning tank, and a cleaning liquid introducing step of reintroducing other cleaning liquid, when chemical liquid concentration detection value of the chemical liquid concentration detector becomes a set value.;COPYRIGHT: (C)1998,JPO