ELECTRON BEAM EXPOSING SYSTEM AND METHOD FOR MANUFACTURING DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To unrequire works of transferring pattern data and converting into control data by a method wherein there is provided data controlling means for transmitting control data corresponding to patterns exposed by an electron beam exposing device which transmitted pattern information in response to the exposure pattern information. ;SOLUTION: A control system 22 commands a deflection control circuit 17 to deflect a plurality of electron beams from an element electronic optical system array by a sub-deflector of a deflector 6. At this time, the control system 22 commands a focus and antigmatism control circuit 2 to control a dynamic focus coil 7 based on dynamic focus correction data which have been beforehand acquired to correct a focus position of a reduction electronic optical system 4. Simultaneously, the control system 22 controls a dynamic staying coil 8 and corrects an astigmatism aberration of a reduction electronic optical system. The sub-deflector of the deflector 6 deflects a plurality of electron beams and simultaneously turns on/off a blanking electrode. Thereby, a sub-field is sequently exposed to expose the entire wafer face.;COPYRIGHT: (C)1997,JPO