ELECTRON BEAM EXPOSING APPARATUS, ELECTRON BEAM EXPOSING METHOD AND ELECTRON BEAM EXPOSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an electron beam exposing apparatus, an electron beam exposing method and an electron beam exposing system for exposing a plurality of dies depending on a pattern formed on each die in a front-end process, during continuously and simultaneously exposing the dies on a sample using a plurality of masks.;SOLUTION: The apparatus, the method and the system are constituted by including a means 80 for correcting the exposing position of a mask mij of the electron beam exposing apparatus 10 in response to a pattern formed on a sample 30, which includes an electron beam source 14 producing an electron beam 15 and a plurality of masks mij disposed in the path of the electron beam and having an opening and exposes the pattern corresponding to the opening on the surface of the sample 30 using the electron beam 15 passed through the opening of the mask mij.;COPYRIGHT: (C)2005,JPO&NCIPI