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ELECTRON BEAM EXPOSING DEVICE AND ELECTRON BEAM EXPOSING METHOD TO REDUCE CURRENT AMOUNT OF ELECTRON BEAMS
ELECTRON BEAM EXPOSING DEVICE AND ELECTRON BEAM EXPOSING METHOD TO REDUCE CURRENT AMOUNT OF ELECTRON BEAMS
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机译:减少电子束电流量的电子束曝光装置和电子束曝光方法
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摘要
PROBLEM TO BE SOLVED: To eliminate the risk to dissolve a mask having an opening, by fairing the electron beams by cutting the periphery of a crossover image, and furthermore, reducing the current amount of the electron beams, in an electron beam exposing device. SOLUTION: An optical system 10 is positioned at the upstream side from the first slit 115. The optical system 10 cuts a useless electron beam, by forming a crossover image and fairing (cutting partially). The electron beams radiated from an electron gun 114 are cut the current amount by a beam reducing aperture 11, and the crossover image is formed by a crossover image forming lens 12. A fairing round aperture 13 is provided to this position and it fairs the crossover image. The electron beam whose current value is reduced by the fairing is radiated to the first slit 115. By using the electron beam whose current value is reduced, the dissolution of a block mask 120 by the heating can be avoided, and the attachment of the contamination and the accumulation of the charge can be reduced.
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