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ELECTRON BEAM EXPOSING DEVICE AND ELECTRON BEAM EXPOSING METHOD TO REDUCE CURRENT AMOUNT OF ELECTRON BEAMS

机译:减少电子束电流量的电子束曝光装置和电子束曝光方法

摘要

PROBLEM TO BE SOLVED: To eliminate the risk to dissolve a mask having an opening, by fairing the electron beams by cutting the periphery of a crossover image, and furthermore, reducing the current amount of the electron beams, in an electron beam exposing device. SOLUTION: An optical system 10 is positioned at the upstream side from the first slit 115. The optical system 10 cuts a useless electron beam, by forming a crossover image and fairing (cutting partially). The electron beams radiated from an electron gun 114 are cut the current amount by a beam reducing aperture 11, and the crossover image is formed by a crossover image forming lens 12. A fairing round aperture 13 is provided to this position and it fairs the crossover image. The electron beam whose current value is reduced by the fairing is radiated to the first slit 115. By using the electron beam whose current value is reduced, the dissolution of a block mask 120 by the heating can be avoided, and the attachment of the contamination and the accumulation of the charge can be reduced.
机译:解决的问题:在电子束曝光装置中,通过切割交叉图像的周边来使电子束顺畅,并且减小电子束的电流量,从而消除溶解具有开口的掩模的风险。解决方案:光学系统10位于第一狭缝115的上游侧。光学系统10通过形成交叉图像和整流罩(部分切割)来切割无用的电子束。从电子枪114发射的电子束被束减小孔11切断电流量,并且由交叉图像形成透镜12形成交叉图像。在该位置设置有整流罩圆形孔13,该整流罩对交叉透镜进行整流。图片。通过整流罩减小了电流值的电子束辐射到第一狭缝115。通过使用减小了电流值的电子束,可以避免由于加热而导致的阻挡掩模120的溶解,并且避免了污染物的附着。并且可以减少电荷的积累。

著录项

  • 公开/公告号JPH09213257A

    专利类型

  • 公开/公告日1997-08-15

    原文格式PDF

  • 申请/专利权人 FUJITSU LTD;

    申请/专利号JP19960017989

  • 申请日1996-02-02

  • 分类号H01J37/305;G03F7/20;H01J37/04;H01J37/09;H01J37/147;

  • 国家 JP

  • 入库时间 2022-08-22 03:37:20

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