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High speed power semiconductor diode

机译:高速功率半导体二极管

摘要

A high speed power semiconductor diode has a lightly doped first conductivity type middle layer between a heavily doped first conductivity type first outer zone and a second conductivity type second outer zone including a p-n junction, the middle zone thickness and doping concentration Nd being chosen to achieve a defined blocking voltage at a voltage Ur and the entire middle zone containing recombination centres produced at least partially by accelerated particle irradiation. The novelty is that the middle zone contains, in addition to the doping concentration Nd, donors of density Nz+ which are produced by irradiation at below 300 K and which are intermittently provided at less than 300 K after forward current application, the density maximum being sufficiently high to produce avalanche breakdown at -40 deg C by triangular field progress and at 75% of the room temperature specified blocking voltage UR and the density minimum being 20% of the maximum value. Also claimed is a method of measuring the carbon content in silicon by exposing a silicon diode structure to thorough irradiation with fast particles of chosen energy and dose so that the number of radiation-induced donors approaches a saturation value, followed by calculating the carbon concentration from this donor density measurement by deep level transient capacitive spectrometry (DLTS) or by means of the voltage of onset of dynamic IMPATT oscillation.
机译:高速功率半导体二极管在重掺杂的第一导电类型的第一外部区域和包含pn结的第二导电类型的第二外部区域之间具有轻掺杂的第一导电类型中间层,选择中间区域的厚度和掺杂浓度Nd以实现在电压Ur处定义的阻断电压和包含重组中心的整个中间区域至少部分是通过加速粒子辐照产生的。新颖之处在于,除了掺杂浓度Nd之外,中间区域还包含密度Nz +的施主,该施主是在低于300 K的辐射下产生的,并且在施加正向电流后间歇地以低于300 K的速率提供,最大密度足够密度高到在-40摄氏度时通过三角场进展和在室温的75%时指定的阻断电压UR产生雪崩击穿,并且最小密度为最大值的20%。还要求保护一种测量硅中碳含量的方法,该方法是通过使硅二极管结构受到选择的能量和剂量的快速粒子彻底辐照,以使辐射诱导的施主的数量接近饱和值,然后从通过深电平瞬态电容光谱法(DLTS)或通过动态IMPATT振荡的起始电压来测量该供体密度。

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