WAFER CLEANING EQUIPMENT AND TRAY FOR USE IN WAFER CLEANING EQUIPMENT

摘要

Wafer cleaning equipment capable of preventing wafer contamination and allowing effective wafer cleaning and a tray for use in the wafer cleaning equipment. The equipment is provided with a belt-like tray (12) having grooves (12a) to grasp both edges of wafers (1) and surrounding the wafers (1) so that the upper and lower parts of the wafers are exposed and a cleaning bath (20) to clean the wafers (1) held in this tray (12) and transferred by a transfer robot (2). The cleaning bath (20) has guides (22) to place the tray (12) in the bath, a nearly V-shaped bottom (26) fit to the shape of the bottoms of the wafers (1), and outlets (24) to supply a cleaning fluid into the bath. In addition, the cleaning bath (20) has overflow baths (30) on both its sides to receive the cleaning fluid spilling from the cleaning bath (20). The overflow baths (30) have a circulation line (32) to return the cleaning fluid to the cleaning bath (20), and a pump (34) and a valve (36) fitted to the circulation line (32).