WAFER CLEANING EQUIPMENT AND TRAY FOR USE IN WAFER CLEANING EQUIPMENT

摘要

There are provided a wafer cleaning device which prevents the contamination of wafers and which can effectively clean the wafers and a tray for use in the wafer cleaning device.;There are provided a band-shaped tray 12 having grasping grooves 12a for grasping opposite side ends of wafers 1 and surrounding an outer periphery to expose upper and lower portions of the wafers 1, and a cleaning tank 20 to which the wafers 1 inserted in the tray 12 are conveyed by a conveyor robot 2 to be cleaned. The cleaning tank 20 is provided with guides 22 for mounting the tray 12 in the tank, a bottom portion 26 formed substantially in V-shape conforming to the bottom-face shape of the wafer 1, and flow ports 24 via which cleaning fluid is supplied into the tank. Moreover, an outer side face of the cleaning tank 20 is provided with an overflow tank 30 for containing the cleaning fluid overflowing from the cleaning tank 20, and the overflow tank 30 is provided with a circulation line 32 for circulating the cleaning fluid again into the cleaning tank 20, and a pump 34 an a valve 36 attached to the circulation line 32.