首页> 外国专利> Sputter-resistant conductive coatings with enhanced emission of electrons for cathode electrodes in DC plasma addressing structure

Sputter-resistant conductive coatings with enhanced emission of electrons for cathode electrodes in DC plasma addressing structure

机译:直流等离子体寻址结构中用于阴极电极的电子发射增强的耐溅射导电涂层

摘要

A conductive refractory compound coating for electrodes is sputter resistant, very resistant to oxidation, and easy to apply by way of electrophoresis or screen printing. This structure is further enhanced by the presence of surface particles of electrically nonconductive ceramic material. when the cathode electrode is energized, electrically nonconductive material is penetrated by the electric field, which attracts secondary electrons out of the cathode electrode, thereby increasing the cathode's efficiency as an emitter of secondary electrons. More specifically, cathode electrodes are used in a plasma addressing structure. The coating is formed by approximately 5 nm particles, each comprised of a fused matrix of conductive and nonconductive particles co-deposited with frit particles by either electrophoresis or "silk" screening. The coating is subsequently baked to fuse the frit and bond the electrophoretically deposited particles to the electrodes.
机译:用于电极的导电耐火化合物涂层具有耐溅射,极耐氧化的特性,并且易于通过电泳或丝网印刷的方式进行涂覆。非导电陶瓷材料的表面颗粒的存在进一步增强了这种结构。当阴极电极通电时,电场会穿透不导电的材料,从而将二次电子吸引到阴极之外,从而提高了阴极作为二次电子发射器的效率。更具体地说,阴极用于等离子体寻址结构。涂层由大约5 nm的颗粒形成,每个颗粒都包含导电和非导电颗粒的熔合基质,并通过电泳或“丝网”筛分与玻璃料颗粒共同沉积。随后烘烤涂层以熔合玻璃料,并将电泳沉积的颗粒粘结到电极上。

著录项

  • 公开/公告号EP0827176A3

    专利类型

  • 公开/公告日2000-03-08

    原文格式PDF

  • 申请/专利权人 TEKTRONIX INC.;

    申请/专利号EP19970306147

  • 申请日1997-08-13

  • 分类号H01J9/02;H01J17/04;H01J17/06;H01J17/48;

  • 国家 EP

  • 入库时间 2022-08-22 01:48:34

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