RESIST PEELING APPARATUS AND RESIST PEELING LIQUID MANAGEMENT METHOD, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To maintain the element ratio of a resist peeling liquid to the adequate range for a long period of time in the resist for peeling resist residues adhered to a semiconductor wafer using a resist peeling liquid consisting of multiple elements.;SOLUTION: A peeling liquid tank 14 is provided to store the resist peeling liquid. A conductivity monitor 46 is provided to monitor the conductivity of the resist peeling liquid. An additional element tank 50 is also provided to estimate the element ratio of the resist peeling liquid based on such conductivity, and adds the adequate amount of resist peeling liquid based on the estimation result to cover the shortage of such resist peeling liquid.;COPYRIGHT: (C)2001,JPO