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SUPERCONDUCTING DEVICE HAVING PATTERN FORMED BY IMPLANTATION, AND INDIRECT ION-IMPLANTATION METHOD TO SUPERCONDUCTING FILM
SUPERCONDUCTING DEVICE HAVING PATTERN FORMED BY IMPLANTATION, AND INDIRECT ION-IMPLANTATION METHOD TO SUPERCONDUCTING FILM
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机译:具有浸渍法形成的图案的超导器件以及用于超导膜的间接离子注入方法
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摘要
PROBLEM TO BE SOLVED: To provide a process for forming a pattern with a superconducting film by ion implantation at a high manufacture yield.;SOLUTION: An oxide superconducting layer 10 is formed on a substrate 12, over which a passivation layer 14 is deposited. After desired patterning is made using a mask, etc., impurity ions are implanted (18) to the oxide superconducting layer 10 through the passivation layer 14, for causing reaction with the oxygen at an implantation part. Thus, the superconductivity characteristics are suppressed and changed into insulating characteristics, and non-implanted part is completed as a superconducting pattern. The passivation layer 14 has less damages by the ion implantation with respect to the oxide superconducting layer 10, and is of a dielectric material which is appropriate in crystal structure. A device using a multiple layers of an oxide superconducting material over it can be manufactured.;COPYRIGHT: (C)2000,JPO
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