首页>
外国专利>
AUTOMATIC WAFER MAPPING IN A WET ENVIRONMENT ON A WAFER CLEANER
AUTOMATIC WAFER MAPPING IN A WET ENVIRONMENT ON A WAFER CLEANER
展开▼
机译:在晶圆清洁机上的湿环境中自动进行晶圆映射
展开▼
页面导航
摘要
著录项
相似文献
摘要
A wafer mapping method and apparatus for automatically determining the location and orientation of workpieces within a workpiece processing tool. An illumination device is provided which directs light toward the edges of the workpieces and a vision system is utilized to receive and process the images obtained from the light which is reflected off the edges of the workpieces.
展开▼