Two Chambered Chemical Vapor Deposition Apparatus for Producing Quantum Dots

摘要

PURPOSE: A chemical deposition apparatus of a dual chamber for forming a quantum dot is provided to form the size distribution of the quantum dot uniformly by using a process with the dual chamber. CONSTITUTION: A chemical deposition apparatus of dual chamber comprises a reaction chamber(1) and a deposition chamber(2). In the reaction chamber(1), an in-flowed precursor is reacted to generate a charged cluster. The reaction chamber(1) comprises an inlet(11) for flowing in the precursor and a reaction unit(12) for reacting the in-flowed precursor. The deposition chamber(2) comprises an orifice(21) for passing the cluster fell to the lower side of the reaction chamber(1), a shutter unit(22) for blocking or passing the cluster passed through the orifice(21), and a stand(23) for controlling the height of a substrate on which the charged cluster passed through the shutter unit(22) is deposited.