A process chamber of a semiconductor device for producing a chemical vapor deposition apparatus

摘要

The present invention relates to a process chamber of a semiconductor device for producing a chemical vapor deposition apparatus. Processing chamber of the invention is a boat which a plurality of wafer mounting (Boat), surrounding the boat forms a predetermined space, the upper end a surrounding constitutes the inner tube, the inner tube a predetermined space of the cylindrical opening in the dome shape, a cylindrical upper end is sealed with a semi-spherical outer tube, a heater (heater) is formed surrounding the outer tube, is formed at the lower end of the outer tube, said inner tube and connected between the external tube a vacuum exhaust port, the lower end of the inner tube is formed on, and attached to the gas inlet and a lower end of the boat for introducing a process gas into the inner tube, it comprises a boat loader pushing the boat into the inner tube. The length of the dome portion of the inner pipe is preferably at least 5 ㎜. The angle of the dome portion of the inner tube forms the side and 10 ° to 80 ° of the inner tube. Therefore, by making uniform the thickness of a thin film formed on a semi-spherical portion of the outer tube, it is possible to prevent a crack to extend more than twice the piem period, the outer tube discarded becomes less it is effective in cost reduction.